Swift heavy ion radiation damage in nanocrystalline ZrN
- Authors: Janse van Vuuren, Arno
- Date: 2014
- Subjects: Zirconium -- Effect of radiation on , Nanocrystals
- Language: English
- Type: Thesis , Doctoral , PhD
- Identifier: vital:10550 , http://hdl.handle.net/10948/d1020147
- Description: ZrN has been identified as a candidate material for use as an inert matrix fuel host for the transmutation of plutonium and minor actinides. These materials will be subjected to large amounts of different types of radiation within the nuclear reactor core. The types of radiation include fission fragments and alpha-particles amongst others. Recent studies suggest that nanocrystalline material may have a higher radiation tolerance than their polycrystalline and bulk counterparts. Some studies have shown that swift heavy ion irradiation may also significantly modulate hydrogen and helium behaviour in materials. This phenomenon is also of considerable practical interest for inert matrix fuel hosts, since these materials accumulate helium via (n,) reactions and will also be subjected to irradiation by fission fragments. The aim of this investigation is therefore to study the effects of fission fragment and alpha particle irradiation on nanocrystalline ZrN. In an effort to simulate the effects of fission fragments on nanocrystalline zirconium nitride different layers (on a Si substrate) of various thicknesses (0.1, 3, 10 and 20 μm) were irradiated with 167 MeV Xe, 250 MeV Kr and 695 MeV Bi ions to fluences in the range from 31012 to 2.61015 cm-2 for Xe, 1×1013 to 7.06×1013 cm-2 for Kr and 1012 to 1013 cm-2 for Bi. The purpose of this irradiation is to simulate the effects of fission fragments on nanocrystalline ZrN. In order to simulate the effects of alpha particles and the combined effects of alpha particles and fission fragments on nanocrystalline ZrN it was irradiated with 30 keV He to fluences between 1016 and 5×1016 cm-2, 167 MeV Xe to fluences between 5×1013 and 1014 cm-2 and also 695 MeV Bi to a fluence of 1.5×1013 cm-2. He/Bi and He/Xe irradiated samples were annealed at temperatures between 600 and 1000 °C. The different irradiated layers were subsequently analysed via X-ray diffraction (XRD), μ-Raman, transmission electron microscopy (TEM) and nano indentation hardness testing (NIH) techniques. XRD, TEM, μ-Raman and NIH results indicate that ZrN has a very high tolerance to the effects of high energy irradiation. The microstructure of nanocrystalline ZrN remains unaffected by electronic excitation effects even at a very high stopping power. TEM and SEM results indicated that post irradiation heat treatment induces exfoliation at a depth that corresponds to the end-of-range of 30 keV He ions. Results from He/Xe irradiated samples revealed that electronic excitation effects, due to Xe ions, suppress helium blister formation and consequently the exfoliation processes. He/Bi samples however do not show the same effects, but this is possibly due to the lower fluence of Bi ions. This suggests that nanocrystalline ZrN is prone to the formation of He blisters which may ultimately lead material failure. These effects may however be mitigated by electronic excitation effects from certain SHIs.
- Full Text:
- Date Issued: 2014
- Authors: Janse van Vuuren, Arno
- Date: 2014
- Subjects: Zirconium -- Effect of radiation on , Nanocrystals
- Language: English
- Type: Thesis , Doctoral , PhD
- Identifier: vital:10550 , http://hdl.handle.net/10948/d1020147
- Description: ZrN has been identified as a candidate material for use as an inert matrix fuel host for the transmutation of plutonium and minor actinides. These materials will be subjected to large amounts of different types of radiation within the nuclear reactor core. The types of radiation include fission fragments and alpha-particles amongst others. Recent studies suggest that nanocrystalline material may have a higher radiation tolerance than their polycrystalline and bulk counterparts. Some studies have shown that swift heavy ion irradiation may also significantly modulate hydrogen and helium behaviour in materials. This phenomenon is also of considerable practical interest for inert matrix fuel hosts, since these materials accumulate helium via (n,) reactions and will also be subjected to irradiation by fission fragments. The aim of this investigation is therefore to study the effects of fission fragment and alpha particle irradiation on nanocrystalline ZrN. In an effort to simulate the effects of fission fragments on nanocrystalline zirconium nitride different layers (on a Si substrate) of various thicknesses (0.1, 3, 10 and 20 μm) were irradiated with 167 MeV Xe, 250 MeV Kr and 695 MeV Bi ions to fluences in the range from 31012 to 2.61015 cm-2 for Xe, 1×1013 to 7.06×1013 cm-2 for Kr and 1012 to 1013 cm-2 for Bi. The purpose of this irradiation is to simulate the effects of fission fragments on nanocrystalline ZrN. In order to simulate the effects of alpha particles and the combined effects of alpha particles and fission fragments on nanocrystalline ZrN it was irradiated with 30 keV He to fluences between 1016 and 5×1016 cm-2, 167 MeV Xe to fluences between 5×1013 and 1014 cm-2 and also 695 MeV Bi to a fluence of 1.5×1013 cm-2. He/Bi and He/Xe irradiated samples were annealed at temperatures between 600 and 1000 °C. The different irradiated layers were subsequently analysed via X-ray diffraction (XRD), μ-Raman, transmission electron microscopy (TEM) and nano indentation hardness testing (NIH) techniques. XRD, TEM, μ-Raman and NIH results indicate that ZrN has a very high tolerance to the effects of high energy irradiation. The microstructure of nanocrystalline ZrN remains unaffected by electronic excitation effects even at a very high stopping power. TEM and SEM results indicated that post irradiation heat treatment induces exfoliation at a depth that corresponds to the end-of-range of 30 keV He ions. Results from He/Xe irradiated samples revealed that electronic excitation effects, due to Xe ions, suppress helium blister formation and consequently the exfoliation processes. He/Bi samples however do not show the same effects, but this is possibly due to the lower fluence of Bi ions. This suggests that nanocrystalline ZrN is prone to the formation of He blisters which may ultimately lead material failure. These effects may however be mitigated by electronic excitation effects from certain SHIs.
- Full Text:
- Date Issued: 2014
Radiation damage in GaAs and SiC
- Authors: Janse van Vuuren, Arno
- Date: 2011
- Subjects: Gallium arsenide semiconductors
- Language: English
- Type: Thesis , Masters , MSc
- Identifier: vital:10515 , http://hdl.handle.net/10948/1477 , Gallium arsenide semiconductors
- Description: In this dissertation the microstructure and hardness of phosphorous implanted SiC and neutron irradiated SiC and GaAs have been investigated. SiC is important due to its application as a barrier coating layer in coated particle fuel used in high temperature gas cooled reactors. The characterisation of neutron irradiated GaAs has been included in this study in order to compare the radiation damage produced by protons and neutrons since proton bombardment of SiC could in principle be used for out-of-reactor simulations of the neutron irradiation damage created in SiC during reactor operation. The following SiC and GaAs compounds were investigated: As-implanted and annealed single crystal 6H-SiC wafers and polycrystalline 3C-SiC bulk material implanted with phosphorous ions. As-irradiated and annealed polycrystalline 3C-SiC bulk material irradiated with fast neutrons. As-irradiated and annealed single crystal GaAs wafers irradiated with fast neutrons. The main techniques used for the analyses were transmission electron microscopy (TEM) and nano-indentation hardness testing. The following results were obtained for the investigation of implanted and irradiated SiC and GaAs: Phosphorous Implanted 6H-SiC and 3C-SiC The depth of the P+ ion damage was found to be in good agreement with predictions by TRIM 2010. Micro-diffraction of the damage region in P+ implanted 6H-SiC (dose 5×1016 ions/cm2) indicates that amorphization occurred and that recrystallisation of this layer occurred during annealing at 1200°C. TEM analysis revealed that the layer recrystallised in the 3C phase of SiC and twin defects also formed within the layer. Micro-diffraction of the damage region in P+ implanted 3C-SiC (dose 1×1015 ions/cm2) indicates that amorphization also occurred for this sample and that recrystallisation of this layer occurred during annealing at 800°C. Nano-hardness testing of the P+ implanted 6H-SiC indicated that the hardness of the implanted SiC was initially much lower than unimplanted SiC due to the formation of an amorphous layer during ion implantation. After annealing the implanted SiC at 800°C and 1200°C, the hardness increased due to re-crystallisation and point defect hardening. Neutron Irradiated 3C-SiC TEM investigations of neutron irradiated 3C-SiC revealed the presence dark spot defects for SiC samples irradiated to a dose of 5.9×1021 n/cm2 and 9.6×1021 n/cm2. Neutron Irradiated GaAs TEM investigation revealed a high density of dislocation loops in the unannealed neutron irradiated GaAs. The loop diameters increased after post-irradiation annealing in the range 600 to 800 °C. The dislocation loops were found to be of interstitial type lying on the {110} cleavage planes of GaAs. This finding is in agreement with earlier studies on 300 keV proton bombarded and 1 MeV electron irradiated GaAs where interstitial loops on {110} planes became visible after annealing at temperatures exceeding 500 °C. The small dislocation loops on the {110} planes of the neutron irradiated GaAs transformed to large loops and dislocations after annealing at 1000 °C.
- Full Text:
- Date Issued: 2011
- Authors: Janse van Vuuren, Arno
- Date: 2011
- Subjects: Gallium arsenide semiconductors
- Language: English
- Type: Thesis , Masters , MSc
- Identifier: vital:10515 , http://hdl.handle.net/10948/1477 , Gallium arsenide semiconductors
- Description: In this dissertation the microstructure and hardness of phosphorous implanted SiC and neutron irradiated SiC and GaAs have been investigated. SiC is important due to its application as a barrier coating layer in coated particle fuel used in high temperature gas cooled reactors. The characterisation of neutron irradiated GaAs has been included in this study in order to compare the radiation damage produced by protons and neutrons since proton bombardment of SiC could in principle be used for out-of-reactor simulations of the neutron irradiation damage created in SiC during reactor operation. The following SiC and GaAs compounds were investigated: As-implanted and annealed single crystal 6H-SiC wafers and polycrystalline 3C-SiC bulk material implanted with phosphorous ions. As-irradiated and annealed polycrystalline 3C-SiC bulk material irradiated with fast neutrons. As-irradiated and annealed single crystal GaAs wafers irradiated with fast neutrons. The main techniques used for the analyses were transmission electron microscopy (TEM) and nano-indentation hardness testing. The following results were obtained for the investigation of implanted and irradiated SiC and GaAs: Phosphorous Implanted 6H-SiC and 3C-SiC The depth of the P+ ion damage was found to be in good agreement with predictions by TRIM 2010. Micro-diffraction of the damage region in P+ implanted 6H-SiC (dose 5×1016 ions/cm2) indicates that amorphization occurred and that recrystallisation of this layer occurred during annealing at 1200°C. TEM analysis revealed that the layer recrystallised in the 3C phase of SiC and twin defects also formed within the layer. Micro-diffraction of the damage region in P+ implanted 3C-SiC (dose 1×1015 ions/cm2) indicates that amorphization also occurred for this sample and that recrystallisation of this layer occurred during annealing at 800°C. Nano-hardness testing of the P+ implanted 6H-SiC indicated that the hardness of the implanted SiC was initially much lower than unimplanted SiC due to the formation of an amorphous layer during ion implantation. After annealing the implanted SiC at 800°C and 1200°C, the hardness increased due to re-crystallisation and point defect hardening. Neutron Irradiated 3C-SiC TEM investigations of neutron irradiated 3C-SiC revealed the presence dark spot defects for SiC samples irradiated to a dose of 5.9×1021 n/cm2 and 9.6×1021 n/cm2. Neutron Irradiated GaAs TEM investigation revealed a high density of dislocation loops in the unannealed neutron irradiated GaAs. The loop diameters increased after post-irradiation annealing in the range 600 to 800 °C. The dislocation loops were found to be of interstitial type lying on the {110} cleavage planes of GaAs. This finding is in agreement with earlier studies on 300 keV proton bombarded and 1 MeV electron irradiated GaAs where interstitial loops on {110} planes became visible after annealing at temperatures exceeding 500 °C. The small dislocation loops on the {110} planes of the neutron irradiated GaAs transformed to large loops and dislocations after annealing at 1000 °C.
- Full Text:
- Date Issued: 2011
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